Taiwan Build-Up film for ABF substrate

2021-12-02

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Taiwan Build-Up Film

   

● Independent research and manufacure in Taiwan

● Copper can chemical plating on the build-Up film which can replace traditional copper foil substrate.

● Can reduce the thickness of substrate, solve the difficulty of laser drilling on BT substrate.

● Excellent adhensive performance, chemical resistance and grinding material.

● Low CTE to reduce package warpage

● Low Dk & Df

● Preservation condition better than Japan Brand  (0-5 degreeC  6 Months )

● Eco-friendly, do not contain toluene

    

Product Structure:

  

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Taiwan Build-Up Film Process Flow

           

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Width:

         

  • 220mm for 8” Wafer
  • 330mm for 12” Wafer
  • 500~680mm for Panel Size
  • Customized Size
  •             

Thickness:

 20 ~ 200 um

     

Applications:

IC interlayer dielectric material, coreless substrate, 5G product, ABF substrate

    

https://www.waferchem.com.tw/taiwan-build-up-film-en.html